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工业显微镜广泛应用于半导体,电子工业进行晶体,集成电路的检验和科学研究.配备有反射照明,成象和观察系统,偏光装置. Industrial microscope is widely used for crystal, iegrated circuit (IC) examinatio and research. It is supplied with reflected illumination, imaging and viewing system, polarized imaging system.规格 Specifications ◇ 无限远光学系统,管镜焦距200mm Infinitive Optical System, Tube Lens Focal Length 200mm◇ 铰链式三目镜筒,30°倾斜, 瞳距55-75mm Compensation Free Trinocular Tube, Inclined at 30°, Ierpupillary Distance 55-75mm◇ 高眼点,大视场目镜WF10X/22 High Poi and Wide Field Eyepiece WF10/22◇ 长工作距离,平场复消色差物镜2X/0.055, 5X/0.14, 10X/0.28, 20X/0.29, 50X/0.42 Long Working Distance, Plan Apo Objectives 2X/0.055, 5X/0.14, 10X/0.28, 20X/0.29, 50X/0.42◇ 五孔物镜转换器 Quiuple Nosepiece◇ 6″双层活动平台和圆平台 6″Double Layers Mechanical Stage and circle stage◇ 同轴粗微调焦机构,微动格值0.002mm Coaxial Coarse & Fin Focus Adjustme System, Fine Division 0.002mm◇照明系统 Illumination System冷光源光纤反射照明器:12V150WCold Light Fiber Reflected Illnminator: 12V150W